YNC Solutions LLC

Photonics & meta-optic nanofabrication

Consulting, design, and fabrication — from meta-atom library design through wafer-scale patterning and volume replication.

Start a conversation Capabilities

Meta-atom layout — sub-wavelength posts varying across the aperture

What we do

YNC Solutions supports customers across the full meta-optic and photonic device workflow: electromagnetic design of meta-atoms and metasurfaces, electron-beam lithography mastering, nanoimprint replication, and pattern transfer into high-index optical materials.

Our focus is manufacturability — making large-area, high-element-count optics that can actually be written, etched, replicated, and delivered at yield, rather than demonstrated once.

From a single written master to many devices per wafer

Capabilities

Design

Meta-atom and metasurface design, dispersion-engineered libraries, and device modeling from the visible through the long-wave infrared.

E-beam mastering

Electron-beam lithography mastering for large-area, high-element-count patterns, with write-time and fidelity modeling.

Nanoimprint replication

Volume replication from a written master — experience scaling imprint from 2-inch to 6-inch wafers.

Pattern transfer

Plasma etch (RIE/ICP) into silicon, germanium, and other high-index optical materials; ALD and thin-film processes.

Metrology & process control

SEM and ellipsometry-based dimensional metrology, process development, and full run documentation and traceability.

Consulting & scale-up

Fabrication strategy, design-for-manufacturability review, yield and throughput modeling, and scale-up planning.

Background

Established 2017 — Maryland-based; U.S. design and fabrication.
Cooperative Research and Development Agreement with the U.S. Army Research Laboratory for micro- and nanofabrication.
Hundreds of metalenses and meta-surfaces fabricated across multiple optical substrates and material systems.
Two decades of large-format array fabrication — including microshutter arrays for the James Webb Space Telescope and pattern-generator devices for DARPA-funded high-throughput lithography programs.